Published: On

Meet us at SPIE Advanced Lithography

Come and visit our booth at the SPIE Advanced Lithography conference in San Jose, CA, on Feb 23-24 - and see our latest applications of MedeA® in the field of lithography and semiconductor manufacturing (one of the examples modeling pattern collapse issues is below).

Paul Saxe and Jason Coloma will be there throughout the conference, so look us up for a discussion!

Publish while: 
2016 Feb 18 - 10 - 2016 Feb 29 - 10

News & Views

Dr. David Rigby will be speaking at the Golden Gate Polymer Forum on July 26th. Register here to attend!

Applications in Chemical Engineering and the Oil & Gas Industry. Watch it here!

Our scientists are traveling in June to give presentations on many materials and programs...

Click here to watch the recording!

Click here to see the new capabilities of 2.21

Software Platforms for Electronic/Atomistic/Mesoscopic Modeling: Status and Perspectives