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Meet us at SPIE Advanced Lithography

Come and visit our booth at the SPIE Advanced Lithography conference in San Jose, CA, on Feb 23-24 - and see our latest applications of MedeA®in the field of lithography and semiconductor manufacturing (one of the examples modeling pattern collapse issues is below).

Paul Saxe and Jason Coloma will be there throughout the conference, so look us up for a discussion!

Publish while: 
2016 Feb 18 - 10 - 2016 Feb 29 - 10

News & Views

Erich Wimmer will give an invited talk at this year's MRS in Boston Nov 27-Dec 2, 2016

Our thoughts and prayers are with a valued colleague's family

This year's UGM was held in Seattle, Washington

Amorphous Materials Builder, HT Launchpad, VASPsol

Three different times on April 5th, 6th and 7th

Feb 23-24, San Jose, CA