Key ingredients
Computational band-structure engineering of III-V semiconductor alloys
Accurate band structures of binary semiconductors AB (A = Al, Ga, In and B = P, As, Sb) and selected ternary III–V semiconductors were calculated using an all-electron screened exchange approach within the full potential linearized augmented plane-wave method. Fundamental band gaps and Γ–L and Γ–X separations in higher-lying conduction bands are predicted with an accuracy of a few tenths of 1 eV. Screened exchange also performs better than the local density approximation for calculating conduction-band effective masses. Highly n-doped InPAs materials with compositions near InP₀.₂As₀.₈ offer lower effective masses, greater optical band-gap shifts, and potentially higher electron mobility than n-doped InGaAs materials with comparable band gaps.
Search
Customer login
Full Text and Download
Learn more about ...
- Ab Initio Calculations for Industrial Materials Engineering: Successes and Challenges
- Interfacial oxygen and nitrogen induced dipole formation and vacancy passivation for increased effective work functions in TiN/HfO₂ gate stacks
- Volume and composition dependence of direct and indirect band gaps in ordered ternary III-V semiconductor compounds: A screened-exchange LDA study
- SrTiO₃ and BaTiO₃ revisited using the projector augmented wave method: Performance of hybrid and semilocal functionals
- Dielectric properties and excitons for extended systems from hybrid functionals
- Ground-state properties of multivalent manganese oxides: Density functional and hybrid density functional calculations
- The structure of amorphous sulfur
- Atomic structure determination of the 3C -SiC(001) c(4×2) surface reconstruction: Experiment and theory
- Atomic Structure of Hydrodesulfurization (HDS) Catalysts
- Graphite Electrode Elastic Properties upon Li Intercalation