Meet us at SPIE Advanced Lithography

February 18, 2016

Come and visit our booth at the SPIE Advanced Lithography conference in San Jose, CA, on Feb 23-24 - and see our latest applications of MedeA in the field of lithography and semiconductor manufacturing (one of the examples modeling pattern collapse issues is below).

 

Paul Saxe and Jason Coloma will be there throughout the conference, so look us up for a discussion!

 

 

 

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